胡志高 + 关注学者
  • 所属院系:信息科学技术学院
  • 认领成果数 240
  • wos论文数 213
  • wos被引 1,914
  • wos篇均被引 8.99

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1. Growth of Bi2O3 Ultrathin Films by Atomic Layer Deposition 代表性成果 SCOPUS SCIE EI

作者:Shen, YD;Li, YW;Li, WM;Zhang, JZ;Hu, ZG;Chu, JH

通讯作者:Li, Y.W.(ywli@ee.ecnu.edu.cn)

通讯作者地址:Li, YW (reprint author), E China Normal Univ, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R China.

作者机构:[Shen, Y. D.; Li, Y. W.; Zhang, J. Z.; Hu, Z. G.; Chu, J. H.] E China Normal Univ, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples 更多

来源:JOURNAL OF PHYSICAL CHEMISTRY C,2012,116,5,3449-3456

收录类别:SCOPUS;SCIE;EI

当年影响因子:4.536

WOS被引:36

Scopus被引:38

资源类型:外文期刊论文

2. Structural, optical and electrical properties of high-k ZrO2 dielectrics on Si prepared by plasma assisted pulsed laser deposition 代表性成果 SCOPUS SCIE EI

作者:Zhang, W;Cui, Y;Hu, ZG;Yu, WL;Sun, J;Xu, N;Ying, ZF;Wu, JD

通讯作者:Wu, J.D.(jdwu@fudan.edu.cn)

通讯作者地址:Wu, JD (reprint author), Fudan Univ, Shanghai Ultra Precis Opt Mfg Engn Ctr, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China.

作者机构:[Zhang, W.; Cui, Y.; Sun, J.; Xu, N.; Ying, Z. F.; Wu, J. D.] Fudan Univ, Shanghai Ultra Precis Opt Mfg Engn Ctr, Dept Opt Sci & Engn, Shanghai 200433 更多

来源:THIN SOLID FILMS,2012,520,20,6361-6367

收录类别:SCOPUS;SCIE;EI

当年影响因子:1.879

WOS被引:20

Scopus被引:19

资源类型:外文期刊论文

3. Photoluminescence and Lasing Properties of Catalyst-Free ZnO Nanorod Arrays Fabricated by Pulsed Laser Deposition 代表性成果 SCOPUS SCIE EI

作者:Li, Q;Gao, K;Hu, ZG;Yu, WL;Xu, N;Sun, J;Wu, JD

通讯作者:Sun, J.(jsun@fudan.edu.cn)

通讯作者地址:Wu, JD (reprint author), Fudan Univ, Dept Opt Sci & Engn, Minist Educ, Key Lab Micro & Nano Photon Struct, Shanghai 200433, Peoples R China.

作者机构:[Li, Qian; Gao, Kun; Xu, Ning; Sun, Jian; Wu, Jiada] Fudan Univ, Dept Opt Sci & Engn, Minist Educ, Key Lab Micro & Nano Photon Struct, Shanghai 200433 更多

来源:JOURNAL OF PHYSICAL CHEMISTRY C,2012,116,3,2330-2335

收录类别:SCOPUS;SCIE;EI

当年影响因子:4.536

WOS被引:21

Scopus被引:21

资源类型:外文期刊论文

4. Transparent polycrystalline monoclinic HfO2 dielectrics prepared by plasma assisted pulsed laser deposition 代表性成果 SCOPUS SCIE EI

作者:Ying, ZF;Sun, J;Hu, ZG;Yu, WL;Xu, N;Wu, JD

通讯作者:Wu, J.(jdwu@fudan.edu.cn)

通讯作者地址:Wu, JD (reprint author), Fudan Univ, Dept Opt Sci & Engn, Minist Educ, Key Lab Micro & Nano Photon Struct, Shanghai 200433, Peoples R China.

作者机构:[Ying, Zhifeng; Sun, Jian; Wu, Jiada] Fudan Univ, Dept Opt Sci & Engn, Minist Educ, Key Lab Micro & Nano Photon Struct, Shanghai 200433, Peoples R Chi 更多

来源:JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2012,30,1

收录类别:SCOPUS;SCIE;EI

当年影响因子:1.374

WOS被引:1

资源类型:外文期刊论文

5. Annealing behaviors of structural, interfacial and optical properties of HfO2 thin films prepared by plasma assisted reactive pulsed laser deposition 代表性成果 SCOPUS SCIE EI

作者:Ying, ZF;Tang, WT;Hu, ZG;Li, WW;Sun, J;Xu, N;Wu, JD

通讯作者:Wu, J.(jdwu@fudan.edu.en)

通讯作者地址:Wu, JD (reprint author), Fudan Univ, Key Lab Adv Photon Mat & Devices, Minist Educ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China.

作者机构:[Ying, Zhifeng; Tang, Wentao; Sun, Jian; Xu, Ning; Wu, Jiada] Fudan Univ, Key Lab Adv Photon Mat & Devices, Minist Educ, Dept Opt Sci & Engn, Shanghai 更多

来源:JOURNAL OF MATERIALS RESEARCH,2010,25,4,680-686

收录类别:SCOPUS;SCIE;EI

当年影响因子:1.673

WOS被引:4

Scopus被引:5

资源类型:外文期刊论文

6. Synthesis and characterization of HfO2 and ZrO2 thin films deposited by plasma assisted reactive pulsed laser deposition at low temperature 代表性成果 SCOPUS SCIE EI

作者:Tang, WT;Ying, ZF;Hu, ZG;Li, WW;Sun, J;Xu, N;Wu, JD

通讯作者:Ying, Z. F.(zfying@fudan.edu.cn)

通讯作者地址:Ying, ZF (reprint author), Fudan Univ, Key Lab Micro & Nano Photon Struct, Minist Educ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China.

作者机构:[Tang, W. T.; Ying, Z. F.; Sun, J.; Xu, N.; Wu, J. D.] Fudan Univ, Key Lab Micro & Nano Photon Struct, Minist Educ, Dept Opt Sci & Engn, Shanghai 2004 更多

来源:THIN SOLID FILMS,2010,518,19,5442-5446

收录类别:SCOPUS;SCIE;EI

当年影响因子:1.879

WOS被引:19

Scopus被引:22

资源类型:外文期刊论文

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