全部成果分类

  • FIFTH INTERNATIO...(1)

按条件检索“1”条记录

已选条件: 刊名: FIFTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS × 资源类型: 外文会议论文 ×
导出
  • 排序
  • 显示
1. Influence of experimental environment on the process of photo-assisted electrochemical etching process on silicon SCOPUS CPCI-S EI

作者:Chen, Y;Guo, PS;Wang, LW

通讯作者:Wang, L.(lwwang@ee.ecnu.edn.cn)

通讯作者地址:Wang, LW (reprint author), E China Normal Univ, Dept Elect Engn, Shanghai 200062, Peoples R China.

作者机构:[Chen, Y; Guo, PS; Wang, LW]E China Normal Univ, Dept Elect Engn, Shanghai 200062, Peoples R China.

来源:FIFTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS,2004,5774,575-578

收录类别:SCOPUS;CPCI-S;EI

资源类型:外文期刊论文;外文会议论文

TOP