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1. Less Than 10(-13) W Weak Light Response for Quantum Dots Photodetector at Room Temprature SCIE CPCI-S

作者:Wang, MJ;Jin, XB;Guo, FM

通讯作者地址:Wang, MJ (reprint author), East China Normal Univ, Sch Informat Sci Technol, Lab Polar Mat & Devices, Shanghai Key Lab Multidimens Informat Proc, Shanghai, Peoples R China.

作者机构:[Wang, M. J.; Jin, X. B.; Guo, F. M.] East China Normal Univ, Sch Informat Sci Technol, Lab Polar Mat & Devices, Shanghai Key Lab Multidimens Informat 更多

来源:2015 IEEE 10th International Conference on Nano/Micro Engineered and; Molecular Systems (NEMS),2015,44-47

收录类别:SCIE;CPCI-S

会议时间:APR 07-11, 2015

会议名称:IEEE 10th International Conference on Nano/Micro Engineered and; Molecular Systems (NEMS)

资源类型:外文会议论文

2. The charge character in the double-barrier quantum dots in well hybrid structure SCIE CPCI-S

作者:Jin, XB;Guo, FM;Vue, FY

通讯作者地址:Jin, XB (reprint author), East China Normal Univ, Sch Informat Sci Technol, Lab Polar Mat & Devices, Shanghai Key Lab Multidimens Informat Proc, Shanghai, Peoples R China.

作者机构:[Jin, X. B.; Guo, F. M.; Vue, F. Y.] East China Normal Univ, Sch Informat Sci Technol, Lab Polar Mat & Devices, Shanghai Key Lab Multidimens Informat 更多

来源:2015 IEEE 10th International Conference on Nano/Micro Engineered and; Molecular Systems (NEMS),2015,40-43

收录类别:SCIE;CPCI-S

会议时间:APR 07-11, 2015

会议名称:IEEE 10th International Conference on Nano/Micro Engineered and; Molecular Systems (NEMS)

资源类型:外文会议论文

3. The Weak-light Readout and Display of Lower Dimension quantum effect Photodetector CPCI-S

作者:Liu, XY;Shen, JH;Guo, FM;Wang, MJ;Ding, L;Zhang, SH

通讯作者地址:Liu, XY (reprint author), E China Normal Univ, Sch Informat Sci Technol, Lab Polar Mat & Devices, Guangzhou, Peoples R China.

作者机构:[Liu, X. Y.; Shen, J. H.; Guo, F. M.; Wang, M. J.; Ding, L.; Zhang, S. H.] E China Normal Univ, Sch Informat Sci Technol, Lab Polar Mat & Devices, Gua 更多

来源:2014 9TH IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND; MOLECULAR SYSTEMS (NEMS),2014,233-236

收录类别:CPCI-S

会议时间:APR 13-16, 2014

会议名称:9th IEEE International Conference on Nano/Micro Engineered and Molecular; Systems (NEMS)

资源类型:外文会议论文

4. The Improvement of Electrochemical Etching Process for Silicon Microchannel Plates SCOPUS SCIE CPCI-S EI

作者:Yuan, D;Ci, PL;Tian, F;Shi, J;Xu, SH;Xin, PS;Wang, LW

通讯作者:Wang, L.(lwwang@ee.ecnu.edu.cn)

通讯作者地址:Wang, LW (reprint author), E China Normal Univ, Dept Elect Engn, 500 Dongchuan Rd, Shanghai 200241, Peoples R China.

作者机构:[Yuan, Ding; Ci, Pengliang; Tian, Fei; Shi, Jing; Xu, Shaohui; Xin, Peisheng; Wang, Lianwei] E China Normal Univ, Dept Elect Engn, Shanghai 200241, Pe 更多

来源:2009 4TH IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND; MOLECULAR SYSTEMS, VOLS 1 AND 2,2009,964-969

收录类别:SCOPUS;SCIE;CPCI-S;EI

资源类型:外文期刊论文;外文会议论文

5. The Improvement of Electrochemical Etching Process for Silicon Microchannel Plates CPCI-S

作者:Yuan, D;Ci, PL;Tian, F;Shi, J;Xu, SH;Xin, PS;Wang, LW

通讯作者地址:Wang, LW (reprint author), E China Normal Univ, Dept Elect Engn, 500 Dongchuan Rd, Shanghai 200241, Peoples R China.

作者机构:[Yuan, Ding; Ci, Pengliang; Tian, Fei; Shi, Jing; Xu, Shaohui; Xin, Peisheng; Wang, Lianwei] E China Normal Univ, Dept Elect Engn, Shanghai 200241, Pe 更多

来源:2009 4TH IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND; MOLECULAR SYSTEMS, VOLS 1 AND 2,2009,964-969

收录类别:CPCI-S

会议时间:JAN 05-08, 2009

会议名称:4th IEEE International Conference of Nano/Micro Engineered and Molecular; Systems

资源类型:外文会议论文

6. Oxidation of high area ratio silicon microchannels fabricated by electrochemical etching SCIE CPCI-S

作者:Chen, XM;Lin, JL;Xu, SH;Xin, PS;Wang, LW

通讯作者地址:Wang, LW (reprint author), E China Normal Univ, Dept Elect Engn, 500 Dongchuan Rd, Shanghai 200241, Peoples R China.

作者机构:[Chen, Xiaoming; Lin, Jilei; Xu, Shaohui; Xin, Peisheng; Wang, Lianwei] E China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R China.

来源:2008 3RD IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND; MOLECULAR SYSTEMS, VOLS 1-3,2008,78-81

收录类别:SCIE;CPCI-S

会议时间:JAN 06-09, 2008

会议名称:3rd IEEE International Conference of Nano/Micro Engineered and Molecular; Systems

WOS被引:1

资源类型:外文会议论文

7. Investigation of the formation of undercut during the fabrication of silicon microchannels by electrochemical etching SCIE CPCI-S

作者:Lin, JL;Chen, XM;Xu, SH;Xin, PS;Wang, LW

通讯作者地址:Wang, LW (reprint author), E China Normal Univ, Dept Elect Engn, 500 Dongchuan Rd, Shanghai 200241, Peoples R China.

作者机构:[Lin, Jilei; Chen, Xiaoming; Xu, Shaohui; Xin, Peisheng; Wang, Lianwei] E China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R China.

来源:2008 3RD IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND; MOLECULAR SYSTEMS, VOLS 1-3,2008,74-77

收录类别:SCIE;CPCI-S

会议时间:JAN 06-09, 2008

会议名称:3rd IEEE International Conference of Nano/Micro Engineered and Molecular; Systems

WOS被引:1

资源类型:外文会议论文

8. Oxidation of silicon electrochemically etched microchannels Arrays SCOPUS CPCI-S EI

作者:Wu, JX;Wang, LW;Chen, XM;Zheng, MJ;Liu, WL;Song, ZT;Sarro, PM

通讯作者:Wang, L.(lwwang@ee.ecnu.edu.cn)

通讯作者地址:Wang, LW (reprint author), E China Normal Univ, Dept Elect Engn, 3663 N Zhong Shan Rd, Shanghai 200062, Peoples R China.

作者机构:[Wu, JX; Wang, LW; Chen, XM; Zheng, MJ; Liu, WL; Song, ZT; Sarro, PM]E China Normal Univ, Dept Elect Engn, Shanghai 200062, Peoples R Chin 更多

来源:2006 1st IEEE International Conference on Nano/Micro Engineered and; Molecular Systems, Vols 1-3,2006,399-402

收录类别:SCOPUS;CPCI-S;EI

资源类型:外文期刊论文;外文会议论文

9. A novel fabrication approach for microneedles using silicon micromaching technology SCOPUS CPCI-S EI

作者:Wang, X;Chen, XM;Yu, ZY;Wang, LW

通讯作者:Wang, L.

通讯作者地址:Wang, LW (reprint author), E China Normal Univ, Dept Elect Engn, 3663 N Zhong Shan Rd, Shanghai 200062, Peoples R China.

作者机构:[Wang, X; Chen, XM; Yu, ZY; Wang, LW]E China Normal Univ, Dept Elect Engn, Shanghai 200062, Peoples R China.

来源:2006 1st IEEE International Conference on Nano/Micro Engineered and; Molecular Systems, Vols 1-3,2006,545-549

收录类别:SCOPUS;CPCI-S;EI

WOS被引:1

资源类型:外文期刊论文;外文会议论文

10. A novel method of removing polyimide sacrificial layer SCOPUS CPCI-S EI

作者:Guo, XL;Cai, M;Liu, L;Lai, ZS;Zhu, SZ

通讯作者:Lai, Z.(zslai@ee.ecnu.edu.cn)

通讯作者地址:Guo, XL (reprint author), E China Normal Univ, Sch Informat Sci & Technol, Shanghai, Peoples R China.

作者机构:[Guo, XL; Cai, M; Liu, L; Lai, ZS; Zhu, SZ]E China Normal Univ, Sch Informat Sci & Technol, Shanghai, Peoples R China.

来源:2006 1st IEEE International Conference on Nano/Micro Engineered and; Molecular Systems, Vols 1-3,2006,209-212

收录类别:SCOPUS;CPCI-S;EI

资源类型:外文期刊论文;外文会议论文

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